Enhanced Damage Resistance of Mo/Si Multilayer Mirror with Carbon Barrier Layers under Intense Nanosecond EUV Irradiation.

Authors

Chao Yun, Shuhui Li, Yinzhuo Hu, Xiangyue Liu, Zhanglin Hu, Danqiao Xu, Zhe Zhang, Qiushi Huang, Wenbin Li, Zhanshan Wang

Published in

Nano letters. Apr 17, 2025. Epub Apr 17, 2025.

Abstract

The enhancement of damage-resistance capabilities has long been pursued for the development of multilayer mirrors in the field of extreme ultraviolet lithography. Here, single-shot damage experiments were conducted on periodic Mo/Si and Mo/C/Si/C multilayers using nanosecond 13.5 nm EUV radiation. It is revealed that the incorporation of carbon barrier layers significantly enhances the single-shot damage threshold of Mo/Si by about 46%. The crater-like and bump-like damages caused by compaction and expansion are, respectively, observed for Mo/Si and Mo/C/Si/C multilayers. According to characterization results, different damage mechanisms for these two samples have been identified, which are the diffusion reaction for the Mo/Si multilayer and the nonuniform graphitization for the Mo/C/Si/C multilayer. The nonuniform graphitization mechanism is further illustrated by molecular dynamics simulations. Based on the measured multilayer structure, the optical properties of the damaged Mo/C/Si/C multilayer were evaluated at a fluence of 2.68 J/cm² and found to be maintained at a high level.

PMID:
40242864
Bibliographic data and abstract were imported from PubMed on 17 Apr 2025.

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