Continuous-wave vacuum-ultraviolet generation at 192 nm by intracavity second-harmonic and sum-frequency generation.

Authors

Changsheng Zheng, Zihao Tong, Heng Ding, Ning Zhang, Lei Zhu, Yan Gao, Hong Liu, Qinggang Gao, Tianxiang Meng, Kui Wu, Yongguang Zhao, Zhengping Wang, Huaijin Zhang, Haohai Yu

Published in

Optics letters. Volume 51. Issue 17. Pages 4821-4824. Sep 01, 2026.

Abstract

Continuous-wave vacuum-ultraviolet (VUV) radiation near 190-200 nm is highly desirable for high-resolution photoemission spectroscopy, precision spectroscopy, and semiconductor metrology, yet compact all-solid-state sources in this spectral region remain challenging due to the limited nonlinear materials and complex cascaded conversion schemes. Here, we propose a straightforward approach for achieving a VUV laser in the continuous-wave regime with only two-step nonlinear conversion processes. As a proof-of-principle study, we choose a visible Pr:YLF laser platform: the 522-nm (³P₁→³H₅) laser is at first intracavity frequency-doubled to 261 nm and subsequently sum-frequency mixed with the 721 nm (³P₀→³F₄) transition in β-BaB₂O₄ (BBO), delivering milliwatt-level continuous-wave lasers at 192 nm. The proposed approach with two-step nonlinear-frequency up-conversions offers a markedly simplified path for compact, scalable continuous-wave VUV laser sources across the 190-200 nm spectral region.

PMID:
42679255
Bibliographic data and abstract were imported from PubMed on 02 Sep 2026.

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