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Amorphous Nanodomains Enable High Device-Level Cooling Performance in Crack-Free Hot-Extruded n-Type Bi2Te3 Thermoelectrics.

Created on 05 Sep 2026

Authors

Xiaoming Hu, Veera Prabu Kannan, Xin Chen, Jiachang Shui, Yawei Li, Guangqiang Li, Xi'an Fan, Bhuvanesh Srinivasan, Matthew Barnett

Published in

ACS applied materials & interfaces. Sep 07, 2026. Epub Sep 07, 2026.

Abstract

Premature cracking during free hot deformation (FHD) of n-type Bi2Te2.7Se0.3 limits the attainable strain, thereby interrupting dynamic recrystallization (DRX) and capping (0001) basal-texture development. Here, we identify this crack-limited DRX bottleneck through thermomechanical compression and interrupted-deformation evidence, and then eliminate it using hot extrusion (HE), where the inherently triaxial compressive stress state suppresses crack initiation and propagation. Crack-free extrusion enables near-complete DRX and a near-ideal (0001) basal texture, while retaining ∼10 nm amorphous nanodomains, which contribute to reducing lattice thermal conductivity without degrading electrical transport. The optimized alloy is tougher-95.8 MPa in bending and 138.4 MPa in compression (+62%/+48% vs FHD)-and reaches zT ≈ 1.20 at 343 K. Importantly, under strictly identical single-stage micro-TEC assembly and test boundaries (identical p-legs; only n-legs varied), the extruded n-legs increase ΔTmax to an outstanding 75.8 K at Th ≈ 300 K, which is among the highest values reported for Bi2Te3-based TECs under comparable testing conditions. These results establish crack-free hot extrusion as a scalable route to remove the fracture-imposed DRX ceiling in layered brittle thermoelectrics and to translate microstructural gains into device-level cooling performance.

PMID:
42696703
Bibliographic data and abstract were imported from PubMed on 05 Sep 2026.

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