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Interfacial Built-In Electric Field-Driven S-Scheme g-C3N4/S-Doped TiO2 Heterojunction for Boosting Photocatalytic NO Abatement.

Created on 07 Oct 2026

Authors

Pho Thi Le, Thach Khac Bui, Nhat Quang Minh Tran, Tin Chanh Duc Doan, Ali Anus, Sungjin Park, Viet Van Pham

Published in

ACS applied materials & interfaces. Oct 07, 2026. Epub Oct 07, 2026.

Abstract

S-scheme heterojunction engineering has emerged as an effective strategy for enhancing photocatalytic NO removal by facilitating charge separation while maintaining strong redox capability. Herein, an S-scheme heterojunction consisting of S-doped TiO2 nanotubes and g-C3N4 was successfully constructed via an annealing-assisted interfacial engineering strategy. Comprehensive band structure analyses using Mott-Schottky measurements, valence band X-ray photoelectron spectroscopy, and Kelvin probe force microscopy confirmed the formation of an S-scheme heterojunction between S-TiO2 and g-C3N4. The experimental results revealed a favorable band alignment and the establishment of an interfacial built-in electric field between S-TiO2 and g-C3N4, facilitating S-scheme charge transfer across the heterointerface and preserving highly reactive electrons and holes with strong reduction and oxidation capabilities, respectively, thereby promoting the generation of ·O2- and ·OH radicals. As a result, the optimized g-C3N4/S-doped TiO2 nanotube photocatalyst achieved an NO removal efficiency of 74.6%, higher than those of pristine S-TiO2 (43.4%) and g-C3N4 (53.4%), while also suppressing NO2 intermediate formation compared with previously reported TiO2- and g-C3N4-based heterojunctions. This work provides insight into the synergistic role of band alignment, interfacial built-in electric field, and S-scheme charge transfer in boosting photocatalytic NO removal performance.

PMID:
42837633
Bibliographic data and abstract were imported from PubMed on 07 Oct 2026.

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